Chemical Vapor Deposition (journal)

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Chemical Vapor Deposition
CVD cover09.jpg
DisciplineMaterials science
LanguageEnglish
Edited byPeter Gregory
Publication details
History1995-2015
Publisher
FrequencyMonthly
1.333 (2016)
Standard abbreviations
ISO 4Chem. Vap. Depos.
Indexing
CODENCVDEFX
ISSN0948-1907 (print)
1521-3862 (web)
LCCNsn96038108
OCLC no.865512213
Links

Chemical Vapor Deposition was a monthly peer-reviewed scientific journal covering materials science. It was established in 1995 and ceased independent publication in 2015, when it became a section of . The journal was published by Wiley-VCH and the editor-in-chief was Peter Gregory.

Abstracting and indexing[]

The journal was abstracted and indexed in:

According to the Journal Citation Reports, the journal's final (2016) impact factor was 1.333.[6]

References[]

  1. ^ "CAS Source Index". Chemical Abstracts Service. American Chemical Society. Archived from the original on 2016-05-15. Retrieved 2017-09-03.
  2. ^ "Content/Database Overview - Compendex Source List". Engineering Village. Elsevier. Retrieved 2017-09-03.
  3. ^ Jump up to: a b c "Master Journal List". Intellectual Property & Science. Clarivate Analytics. Retrieved 2017-09-03.
  4. ^ "Inspec list of journals" (PDF). Inspec. Institution of Engineering and Technology. Retrieved 2017-09-03.
  5. ^ "Source details: Chemical Vapor Deposition". Scopus preview. Elsevier. Retrieved 2017-09-03.
  6. ^ "Chemical Vapor Deposition". 2016 Journal Citation Reports. Web of Science (Science ed.). Clarivate Analytics. 2017.
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