Plasma processing

From Wikipedia, the free encyclopedia

Plasma processing is a plasma-based material processing technology that aims at modifying the chemical and physical properties of a surface.

Plasma processing techniques include:


Related topics are plasma chemistry, chemical vapor deposition, and physical vapor deposition processes like sputter deposition, plasma iondoping, vacuum plasmaspraying, and reactive ion etching.

See also[]

  • List of plasma (physics) applications articles
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